オノダ ジョウ
小野田 穣 所属 福岡教育大学 教育学部 理科教育研究ユニット 職種 講師 |
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言語種別 | 英語 |
発行・発表の年月 | 2019/01 |
形態種別 | 研究論文 |
査読 | 査読あり |
標題 | Charging of electron beam irradiated amorphous carbon thin films at liquid nitrogen temperature |
執筆形態 | 共著 |
掲載誌名 | Ultramicroscopy |
掲載区分 | 国外 |
出版社・発行元 | Elsevier |
巻・号・頁 | 196,pp.161-166 |
総ページ数 | 6 |
国際共著 | 国際共著 |
著者・共著者 | Simon Hettler, Jo Onoda, Robert Wolkow, Jason Pitters, Marek Malac |
概要 | We studied the charging behavior of an amorphous carbon thin film kept at liquid-nitrogen temperature under focused electron-beam irradiation. Negative charging of the thin film is observed. The charging is attributed to a local change in the work function of the thin film induced by electron-stimulated desorption similar to the working principle of the hole free phase plate in its Volta potential implementation at elevated temperature. The negative bias of the irradiated film arises from the electron beam induced desorption of water molecules from the carbon film surface. The lack of positive charging, which is expected for non-conductive materials, is explained by a sufficient electrical conductivity of the carbon thin film even at liquid-nitrogen temperature as proven by multi-probe scanning tunneling microscopy and spectroscopy measurements. |
DOI | 10.1016/j.ultramic.2018.10.010 |