オノダ　ジョウ   小野田　穣    所属   福岡教育大学  教育学部 理科教育研究ユニット    職種   講師
言語種別	英語
発行・発表の年月	2014/05
形態種別	研究論文
査読	査読あり
標題	Subsurface charge repulsion of adsorbed H-adatoms on TiO2(110)
執筆形態	共著
掲載誌名	The Journal of Physical Chemistry C
掲載区分	国外
出版社・発行元	American Chemical Society
巻・号・頁	118,pp.13674-13679
総ページ数	6
担当区分	筆頭著者
国際共著	国際共著
著者・共著者	Jo Onoda, Chi Lun Pang, Ayhan Yurtsever, Yoshiaki Sugimoto
概要	We have used noncontact atomic force microscopy (NC-AFM) and Kelvin probe force microscopy (KPFM) to directly visualize the presence of charged subsurface impurities on rutile TiO2(110). The subsurface charges add an additional electrostatic force between the sample and tip so that they appear as hillocks in the NC-AFM topography. Analysis of several subsurface defects in the same NC-AFM image reveals that the hillocks have discrete heights, which means that defects at different subsurface levels can be detected and distinguished. H adatoms, which are positively charged at the TiO2(110) surface, were found to be repelled by the buried positive charge, so that they form a ∼80–120 Å wide hydrogen-free zone around the charge. Thus, there is an opportunity to deliberately add dopants in order to exclude or perhaps even to confine certain adsorbates to a local region at the surface.
DOI	10.1021/jp503402w